Investigation of ultra thin boron nitride particles coating by atomic layer deposition method in fluidized bed

Boron nitride is widely use in industry because of its unique physical and chemical properties. Atomic layer deposition (ALD) allows the growth of such ultrathin and conformal films of inorganic materials by using sequential, self-limiting reactions. The ultrathin film layer occurs between ingredients interaction with carrier inert gas due to the cycle number. In this study, ultrathin Al2O3 film layer coating on the hexagonal boron nitride was investigated and characterized by ALD method with a using Trimethylaluminium (TMA) and H2O reactants in fluidized bed. In the first stage of the study, the heat-resistant stainless steel fludized bed device has designed and constructed for ALD process. In the second phase of the study, the coating of BN particles in the fluidized bed with an ultrathin Al2O3 layer by ALD method using TMA and water in the presence of nitrogen gas was investigated. FTIR, XRD, SEM, TEM were used for the characterization of ultrathin Al2O3 coated samples on the BN surface. Zeta potential analysis also investigated for understanding how to change surface charge. As a result of the studies, the hBN is coated with an ultrathin Al2O3 layer.