Investigation of physical properties of chromium doped HfO2 thin films
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Abstract (EN)
In this thesis, HfO2 thin films with additives of 1%, 5%, 10% chromium (Cr) were obtained by sol-gel dipping method on glass-holding surfaces. The films obtained were left to anneal at 500 ° C for one hour. The thicknesses of all thin films were measured with the aid of a photo spectrometer. Structural and optical properties of thin films with thickness determined X-ray diffraction pattern (XRD) and UV-VIS spectrometer were investigated. All analysis and results were compared with HfO2 thin film results obtained by various methods in the literature and the effect of doping ratio was interpreted.
Author
Hicran Arslan Akyüz
How to Cite
Hicran Arslan Akyüz (Master Thesis). Investigation of physical properties of chromium doped HfO2 thin films, 2021, Batman University.
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