Production of pbo thin film by using silar technique and electronic and interfacial properties of the pb/pbo/p-si mis contacts

In recent years, metal oxide thin films have been used extensively in piezoelectric, electronic, optronic devices and photovoltic cells. In this thesis, using SILAR thin film magnification technique, which is low cost and easy to control, the lead oxide (PbO) thin film was enlarged on microscope glass (slide) and inorganic semiconductor silicon (Si) pads. The pads used were coated with SILAR technique after appropriate chemical cleaning processes. Coating was done by keeping the solution at 80 ℃. Films of different thicknesses were obtained by changing the number of dipping rounds during coating. After forming a thin film on the silicon semiconductor, the coating was performed by evaporating the Pb conductor to its upper surface (bright surface). Optical, morphological and structural properties of PbO thin film formed on glass were investigated. The electrical and interface characteristics of the Pb /PbO/p-Si MIS Schottky diode created were investigated in the dark by using current-voltage (I-V), capacity-voltage (C-V) and conductance-voltage (G-V) in 10kHz-2MHz frequency range and capacity-frequency (C-f) characteristics in 1kHz-10MHz frequency range.