Elektrokromik cihaz uygulamaları için metal oksit ince film katmanlarının mıknatıssal saçtırma tekniğiyle kaplanması

Electrochromism is the property of certain materials which involves a change from a bleaching state to a colored state as effect either by the action of an electrical voltage or current. Electrochromic devices (ECD) are formed by materials that are capable of continuously and reversibly modulating their color, usually from a bleaching state to a colored one, with the application of a small electric current. Among this electrochromic materials, WO3 and NiOx metal oxides are the dominant among the electrochromic metal oxides. The applied electric current induces in them a reaction of reduction (gain of electrons) or oxidation (loss of electrons) that modifies the range of energies in which the compound interacts with visible light. In this work WO3 and NiOx were deposited onto ITO coated glass by reactive DC magnetron sputtering in Ar/O2 mixing gas at room temperature. For the deposition process was employed off-axis sputtering method in which the substrate is positioned out of the high-energy particles. The electrochemical properties of the WO3 and NiOx series were measured by using conventional three-electrode configuration in 1 M LiClO4-PC electrolyte.Then with the aim to test the performance of the electrochromic metal oxide films, a five-layer battery-like structure ECD (ITO/WO3/electrolyte/NiOx/ITO) was assembled with an Li+ based liquid electrolyte.The results confirm that off-axis magnetron sputtering provides good feasibility to deposit metal oxide thin films with a good electrochromic performance.