Study of annealing temperature effects on optical and electrical properties of nano sized vanadium oxide thin films

In this thesis, optical, electrical and structural characterization before and after annealing of pulsed DC magnetron sputter deposited, nano sized vanadium oxide thin films on different substrates were investigated. Thin film characterizations carried out with FT-IR (fourier transform infarred), UV-Vis-NIR (ultraviolet-visible-near infrared) and Raman spectroscopies, AFM (atomic force microscopy), FPP (four point probe), XRD (X-ray diffraction) and XPS (X-ray photoelectron spectroscopy) methods. For the purpose of analysing the effects of substrates and annealing temperature, thin films has been deposited on to two different substrates, amorphous SiO2 and Si/SiO2, annealed at specific temperatures between 75-230ºC, characterized and compared with unannealed films. It?s determined that all films are composed of V6O13, V2O5 and VO2 species. Topographic features for these films, optical, electrical properties and annealing temperature were found to be independent, but are completely dependent on the roughness of the substrate. Depending on the annealing temperature, optical properties of vanadium oxide thin films don?t change significantly, but it?s shown that electrical properties can be improved. As a result of the study, nano-sized, mixed-phase vanadium oxide thin films, which absorb UV light completely, showing a transition near room temperature, with a high TCR (temperature coefficient of resistance) value were produced.Anahtar Kelimeler: Pulsed DC, Vanadium Oxide, Optical Properties, Electrical Properties, Annealing