Production of ZnO thin films by chemical spray pyrolysis technique and the investigation of their optical properties

Zinc oxide ( ZnO) film has been produced at the subsrate temperature of 350 5 0C by Chemical Spray Pyrolysis method and the optical and structural propeties of this thin film has been investigated. The thickness of the thin film that was produced has been obtained 3,57 µm with weighing method.The forbidden energy gap of ZnO thin film has been found 2,9 eV by using the optical method. The crystal structure of produced ZnO thin film has been determined as hexagonal wurtzite by means of, X-ray spectra.Absorbance spectra of ZnO thin films that were obtained by uitilizing permeable, damping coefficient, reflection and dielectric constans graphics plotted aganist the wavelength of the optical properties were investigated.The crystal structure of ZnO thin films in the range of 20o?2 ? 70o has been examined with X- ray refrection techniques . It has been shown that the crystal structure of ZnO thin film has the hexagonal wurtzite structure from the sharpest peak(101). ZnO thin film x- ray diffraction patterns by uitilizing , a lattice constan 3,2475 Ao, c lattice constant 5,1734 Ao, particles size 17,834 nm, dislocation density 3,14x10-2 nm-2 were calculed. Besides, a, b and c lattices that has been calculated are close to values observed in the ASTM standarts.Keywords: Semiconductor thin film, Chemical spray technique, Structural and optical properties, Semiconductors, ZnO.