The effects of deposition potential and electrodeposition positions on the production of CdS films by electrodeposition

In this study, CdS semiconductor films were obtained by electrochemical deposition method. Chronoamperometry method was used in the production of films. The production of films was carried out in two stages. In the first stage, films were produced at different cathodic potential values. The films produced were analysed and the optimum cathodic potential value was determined. In the second stage; five different covers were used in the production of films. Thus, the distances between the working electrode, reference electrode and counter electrode were changed. All the productions in the second stage were carried out using the optimum cathodic potential value determined in the first stage. The optical properties of all produced films were determined by measuring the absorbance values against wavelengths using a UV-VIS device. Structural characteristics of the films were determined by XRD analyses. The elemental and morphological structures of the films were detailed using SEM-EDX device. In order to determine the surface roughness of the films, SEM images of the CdS films produced were processed in Image J Sofware and surface depth coefficients were calculated. All analyses were evaluated and CdS films providing optimum conditions for the production of solar cell substrates were determined.