Görev döngüsü üretim parametresinin atmalı dc reaktif magnetron sıçratma tekniği ile üretilmiş vanadyum oksit ince filmlerin özelliklerine etkisi

Vanadium oxide is an amphoteric material with four principal oxide forms. Properties of vanadium oxide thin films depend on the amount and distribution of these four principal oxides and intermediate phases thus providing different application areas. One of the effective parameters that can adjust the composition and distribution of the phases in pulsed DC reactive magnetron sputtering is the duty cycle of the power source. The aim of this thesis study is to investigate the effect of duty cycle on the properties of vanadium oxide thin films deposited by pulsed DC reactive magnetron sputtering. Electrical properties, surface properties and crystallographic properties of films deposited using duty cycles between 10% and 32,5% are measured to determine the relationship between the properties and the duty cycle. Electrical characterization results indicate that resistance and resistivity of the vanadium oxide thin films are inversely proportional with duty cycle. The results contribute to the appropriate duty cycle determination for deposition of vanadium oxide thin films for chosen application.