Properties of electrodeposited metalic systems(Schottky diodes) on semiconductor substrates

In this study, by using n-type Si substrate with (100) orientation, 150 nm thickness and 10-20 ?m resistivity and chromium doped, thin film Schottky diode system (Cr/n-Si SBHs which is electrochemically formed on n-type Si) is constructed and characterized.In the electrical characterization of this diodes, the current ?voltoge (I-V) and the capacitance ? voltage (C-V) measurements are done.The basic diode parameters such as ideality factor (n) and barrier height (?b) were consequently extracted from electrical measurements. It has been shown that the ideality factors increased and barrier heights decreased with the decreasing temperatures, on the basis of the thermionic emission (TE) theory.The homogeneity or the uniformity of the Schottky BH is an issue with important implications on the theory of Schottky barrier formation and important ramifications for the operation of Schottky barrier diodes and contacts. Thus, provided semiconductor substrate is well characterized, the homogeneous Schottky BH may be obtained even from the I-V characteristics of one contact. For this purpose ,Cr/n-type Si SBHs with a doping density of about 1.25x1015 cm-3 is prepared and the linear region with large BHs is used. The electrical characterisitics of Cr/n-type structures were investigated in the wide temperature range (80-320 K) by steps of 20 K.Key words: Silicon, Schottky barrier diodes, Electrodeposition Method.