Production of TiO2 thin film using spray pyrolyse method and its application in metal/TiO2/Sİ MIS structures

Today, titanium dioxide (TiO2) is one of the most researched metal oxide materials due to its nanoparticle structure, which is structurally in the form of white powder, and its economic and extraordinary physical and chemical properties. In these studies, it is seen that titanium dioxide has very different usage areas. Gas detection, water treatment, electrochromic devices, photovoltaic cell, etc. It has a wide variety of application areas such as These materials can be synthesized by different methods, including sol-gel, physical vapor growth, chemical vapor growth and electrodeposition. In this thesis, spray pyrolysis method was used. TiO2 thin films were coated on glass substrates and inorganic semiconductor Si (silicon) substrate. This method is low cost and easy to control. After the bases were chemically cleaned, the glass substrate was covered with the spray pyrolysis technique from a height of 25 cm in a horizontal axis for 3 seconds. The coating process was carried out at a constant temperature of 80 °C. After forming a thin layer on the Si crystal, Al metal was evaporated on the upper side by physical evaporation method (PVD). As a result of this study, it was determined that the TiO2 thin films were dense and smooth. The morphological structure and optical properties of the TIO2 thin-layer film formed on the glass substrate were investigated. Metal/TiO2/Si diode interfaces and their electrical properties were investigated by current-voltage (I-V) and capacitance-voltage (C-V) measurements in dark environment.