Preparation of ge nanostructures using pulsed laser ablation for toxicity gas sensor detection

Toxic gas sensors are instruments used to detect and quantify hazardous gas levels in the atmosphere. These sensors are commonly used in industrial and commercial settings where there is a risk of exposure to harmful gases. The sensor works by detecting the presence of the gas and providing an alert when the concentration reaches a dangerous level. In this work, nanostructures of germanium dioxide GeO2 films were fabricated using pulsed laser ablation technology with laser wavelength 1064nm and laser energy 2000 mJ at different pulses (500, 1000, 1500, 2000, 2500). The structural and the optical properties were studied, and the sensitivity property was studied after deposition on quartz and silicon bases at 50 and 100°C. X-Ray diffraction (XRD) study showed that all (XRD) patterns have crystallized well, with three diffraction peaks related to GeO2, hexagonal structure, and orthorhombic structure. The field emission scanning electron microscopy (FESEM) showed that the particle sizes ranged between 15-274 nm and the average particle sizes were 106, 140.9, 87.6, 81.68, and 117 nm. Absorbance and transmittance Ultraviolet-visible (UV-Vis) spectroscopy was used to investigate the optical characteristics of germanium dioxide films.