Radio frequency and methods sputtering Titanium Nitride (TiN) investigation of generation of thin films and some physical properties
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Abstract (EN)
ABSTRACT:In this study, titanium nitride (TiN) thin films were deposited on glass substrates with Radio Frequency Sputtering method. The microstructure and surface morphology of thin films were analyzed with X-ray diffractrometer (XRD) , Atomic Force Microscopy and Scanning Electron Microscope(SEM).The qualitative analysis of films were made with Energy Dispersive X-ray Spectroscopy(EDX). Also the optical transmission of films were determined with UV-Vis Spectrophotometer
Author
Murat Polater
How to Cite
Murat Polater (Master Thesis). Radio frequency and methods sputtering Titanium Nitride (TiN) investigation of generation of thin films and some physical properties, 2016, Afyon Kocatepe University.
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