Magnification of nanoscale vanadium oxide thin film smart materials at different thicknesses

Vanadium Oxide (VOx) is used for different applications because of the difference in temperature due to the fact that it has a conductive phase transition from the semiconductor phase and because of its many remarkable properties. In addition, Vanadium Oxide stands out because it has values such as high TCR (resistance temperature constant), low electrical noise and low electrical resistance (R). Within the scope of this master thesis, the effect of subsoil effect and thickness on the SiO2/Si and Si3N4/SiO2/Si substratum grown at different thicknesses on VOx thin films was investigated by percussive DC reactive magnetron sputtering (P-DC RMS) method and its electrical and structural properties were examined.