Perovskit güneş pillerinde boşluk taşıma katmanları için nikel oksit saçtırma hedef malzemelerinin üretilmesi

Perovskite solar cells have been an interesting subject of research in recent years due to their low production cost, their ability to allow a wide variety of design changes, and the high efficiency they reach in a short time. Inorganic p-type semiconductors used as hole transport material, a crucial layer in perovskite solar cells, have high transparency, structural stability, and adjustable band gaps. Nickel oxide (NiOx) stands out compared to other inorganic hole transport material with its high thermal and chemical stability, optical transparency, wide bandgap (3.6 - 4.0 eV), low material cost. In the thesis, the target materials obtained for deposition of NiOx thin films that are desired to be used as hole transport material, consist of powders produced by sol-gel method. The pristine and lithium-doped NiOx powders were successfully produced by the sol-gel method. The NiOx based powders were preformed into NiOx target materials with a bulk density of 95 percent and above, using an isostatic press. Then the obtained target materials were used in the RF magnetron sputtering system to produce NiOx thin films. The thicknesses of films, which were successfully deposited on the glass/ ITO substrate, were measured between 110- 230 nm. Consequently, the obtained target materials exhibited promising for the production of thin films that can be used in perovskite solar cells. At the end of each production step, the materials were structurally and morphologically characterized by relevant characterizations such as X-ray diffraction, X-ray photoelectron spectroscopy, scanning electron microscopy, particle size distribution, and density measurement.