Production and characterization of carbon nanowall thin films by pulsed filtered catodic vacuum arc deposition and electron cyclotron resonance microwave plasma tecniques

In this study, the carbon nanowall thin films were deposited on glass and silicon substrates by using Pulsed Filtered Cathodic Vacuum Arc Deposition (PFCVAD) system and electron cyclotron resonance microwave plasma (Electron Cyclotron Resonance Microwave Plasma, ECR-MP) techniques. Optical properties of the produced thin films were analyzed by employing UV-VIS-NIR Spectrophotometer. Crystallographic and structural properties were determined by using XRD, FTIR and Raman measurements. In order to determine the surface morphology, AFM and SEM analyzes were made.