Development of halogen substrate heater for the growth of thin films

In this thesis, a compact and high performance halogen substrate heater has been developed. This heater is compatible to use in thin film deposition systems particularly highly reactive gas environment for in-situ thin film processing. Since the YBCO thin film deposition needs agressive process conditions compered to the crystalline thin film deposition in general, it has been choosen as the main thin film process for this heater. In this maner, the commercial substrate heaters have been inspected and the main drowbacks of them in such extreme parameters for in-situ thin film growth like superconductive YBCO thin films have examined, and possible solutions in order to achieve a high performance heater that can handle the needs for thoose processes have been determined. By keeping the feasibility and production costs in mind, a compact and durable heater has been developed with high heating performance by using a halogen lighting source. This substrate heater has been tested in air, in ultra-high vacuum as well as Argon and Oxigen gas flow and Oxigen atmosphere in order to satisfy the growth process of the YBCO thin film. In the light of this data, it has been shown that the heater developed in this thesis is competible for ultra-high vacuum thin film systems which does not produce any outgasing. It is also compact which does not need cooling during the process. The temperature controlling is very precise and the heating performance is very high that it can reach the highest tempetature (i.e. 1000oC) in seconds.