Investigation of physical propenties of titanium thin films grown by DC magnetron sputtering technique

In this study, the effect of gas pressure on 300 nm-thick titanium (Ti) thin films grown by direct current (DC) magnetron sputtering technique and the surface morphologies and elemental compositions of thin-films due to the sputtering gas (argon) pressure values of 10, 20 and 30 mTorr with a substratum temperature of 150 oC for 15 minutes have been investigated. Micro structures of the samples have been studied by Atomic Force Microscope, X-Ray Diffraction, Scanning Electron Microscope and Energy Dispersive X-Ray techniques.