Production of SnO2 coating by used chamical vapour deposition (CVD)

Key words: Tin oxide, CVD, Crystallin, Electrical properties, Electro-optical Tin oxide films have been widely used as conductive electrodes on glass substrates because of their transparency in the visible region of the spectrum, and as antireflective coatings in solar energy applications. They can be prepared by various methods such as reactive sputtering , spray pyrolysis sol-gel techniques, chemical vapour deposition (CVD) using organic and inorganic precursors, etc. The study of the optical properties of SnO2 films is of major importance in the design of optical and electro-optical configurations. Tin oxide thin films were grown by chemical vapor deposition (CVD) on glass substrates at atmospheric pressure (AP) and different temperatures of 400, 500 and 600°C. The deposition times were also altered from 15 to 60 minutes with 15 minutes time intervals to investigate the effect of deposition time. A horizontal home-made reactor was used for the deposition from SnCI2 precursors with flowing pure oxygen at a rate 5 scpm. The structure was analyzed by X-ray diffraction (XRD), scanning electron microscopy (SEM) and atomic force microscopy (AFM) facilities to reveal the deposition mechanisms and crystalline structure Energydispersive spectroscopy (EDS) was conducted to understand the elemental surface composition of the films produced. It was detected that the morphology and the oxide structure were changed with deposition time and temperature. The optical and electrical properties were also studied to reveal a relationship between physical properties and production parameters of the resultant thin films.