Metal oksit ALD filmlerin fotokatalitik aktivitelerininincelenmesi

TiO2 and ZnO thin film photocatalysts were deposited on glass fabric by atomic layer deposition. Post annealing of the thin films was carried out at 450 °C and 600 °C for two hours. Photocatalytic activities of TiO2 and ZnO were investigated by using methylene blue degradation efficiency under a solar simulator and UV lamp. The morphology of the thin films was investigated by FESEM and AFM. Elemental analysis and crystal structure of ALD thin films were explored by XPS and XRD, respectively. The optical properties of the thin films were investigated by UV-Vis spectrophotometer. 450 °C annealed TiO2 thin film was exhibited the highest photocatalytic activities in both "as-deposited" and annealed TiO2 ALD thin films, having transformed into anatase phase from amorphous and low bandgap energy. "As deposited" ZnO ALD thin films showed the highest photocatalytic activities compared to both TiO2 and ZnO ALD thin films having well crystalized hexagonal wurtzite structure, oxygen vacancy (Vo), and low bandgap energy.