Formation of organic – inorganic hybrid alucone thin films by molecular layer deposition method

In thus study, hybrid alucone thin films were deposited by the MLD (Molecular Layer Deposition) method. Hybrid alucone thin films; ıt is produced on silicon wafer, glass slide and glass fabric surfaces. Two different alucons were produced by using different precursors as TMA-EG and TMA-GL. QCM device was used to monitor the accumulation rate during production. Surface chemistry was examined by FT-IR analysis on coated surfaces. In order to determine the film thickness on the silicon layer, ellipsometry analysis was performed. During the production of hybrid alucone thin film, situations such as uncontrolled growth, oxidation and infiltration were encountered and solutions were produced.