Electrical and 1/f noise caharacterization of nano scale Vanadium Oxide thin films

Vanadium oxide shows semiconductor to metal transition with temperature; thus it is used in microelectromechanical devices. Vanadium oxides are getting attention with their high temperature coefficient of resistance (TCR), low electrical noise and lower resistivity. For industrial applications, lower noise values are prefable, thus investigations on Vanadium Oxide based systems are still being investigated intensively. In the present study, the deposition parameters of the VOx thin films have desired properties for industrial applications will be determinded. Structural properties studied by X-Ray diffraction and reflection techniques. Then, the VOx thin films will deposited onto the finger type electrodes, and influence of structural properties and their relationship with electrical properties will be investigated. Electrical properties will be carried out by analyzing the TCR, electrical resistance and electrical noise values of the VOx thin films.