The effect of nano silicon (nano-Si) application on drought tolerance of sweet sorghum (Sorghum bicolor var. saccharatum (L.) Mohlenbr.)

In this study, the effects of different doses of nano-silicon (nSi) (nSi1: 0 mM, nSi2: 1,0 mM, nSi3: 2,0 mM ve nSi4: 3,00 mM) on drought tolerance (K1: 100% irrigation/SK/control, K2: 75% irrigation/SK, K3: 50% irrigation/SK and K4: 25% irrigation/SK) in sweet sorghum (Sorghum bicolor var. saccharatum (L.) Mohlenbr.) were investigated. The research was carried out under greenhouse conditions in 11 L capacity plastic pots according to a randomized split plot design with three replications as different drought levels constituted main plots and different nSi doses constituted sub plots. As a result of the research, it was determined that drought stress caused negative effects ranging from 4% to 66% on all examined traits. In addition, in nSi applications with drought stress, compared to control plants; 4-51% improvement in plant height, 15-122% in plant fresh weight, 20-110% in plant dry weight, 2-15% in stem thickness, 3-21% in leaf length, 2-18% in leaf width, 1-45% in leaf number and 1-19% in YOSI value was achieved. As a result; It was determined that the applied nSi positively affected the negativities caused by drought stress at varying rates and the nSi3 (2,0 mM) dose gave better results compared to other applications