Investigation of physical propenties of titanium thin films grown by DC magnetron sputtering technique
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Abstract (EN)
In this study, the effect of gas pressure on 300 nm-thick titanium (Ti) thin films grown by direct current (DC) magnetron sputtering technique and the surface morphologies and elemental compositions of thin-films due to the sputtering gas (argon) pressure values of 10, 20 and 30 mTorr with a substratum temperature of 150 oC for 15 minutes have been investigated. Micro structures of the samples have been studied by Atomic Force Microscope, X-Ray Diffraction, Scanning Electron Microscope and Energy Dispersive X-Ray techniques.
Author
Ümüt Kaplan
How to Cite
Ümüt Kaplan (Master Thesis). Investigation of physical propenties of titanium thin films grown by DC magnetron sputtering technique, 2019, Fırat University.
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