Optimization of electron cyclotron resonance microwave plasma (ECR-MP) system
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Abstract (EN)
In this work, the Electron Cyclotron Resonance Microwave Plasma(ECR-MP) system was set up. The conditions for producing plasma and also for stabilizing the system were determined by changing the power of the system and the gas flow rate. The carbon based semiconducting thin films were deposited on glass substrates at room temperature by using this system. The Methane (CH4) gas were used to produce the plasma. During the deposition of the film, the power, pressure and gas flow rate values of the system were optimized in order to produce the best film. The optical and electrical properties of the carbon based semiconducting thin films prepared were investigated.
Author
Saadet Yıldırımcan
How to Cite
Saadet Yıldırımcan (Master Thesis). Optimization of electron cyclotron resonance microwave plasma (ECR-MP) system, 2011, Çukurova University.
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