Production of carbon nitride thin films and determination of their physical properties
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Abstract (EN)
In this study, amorphous carbon nitride (a-CNx) thin films were deposited at room temperature (25°C) on glass and silisyum substrates via Electron Cyclotron Resonance Chemical Vapor Deposition (ECR-CVD) system. Amorphous carbon nitride thin films have been deposited at various CH4/N2 gas flow ratios in order to maximise the carbon-nitrogen bonds. Finally, optical, structural, electrical and morphological properties of these thin films were determined and discussed.
Author
Zeliha Şeker
How to Cite
Zeliha Şeker (Doctorate thesis). Production of carbon nitride thin films and determination of their physical properties, 2016, Çukurova University.
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