Residual stress and texture analysis on TaN thin films
Is this your thesis?
This record came from a bulk archive import. If it’s yours, link it to your profile.
Abstract (EN)
In this study, in order to investigate film deposition parameters effect on residual stress and texture properties of radio frequency (RF) reactive magnetron sputtered tantalum nitride (TaN) thin films X-ray diffraction (XRD) θ-2θ scan, residual stress analysis (XRSA), pole figure, grazing incidince wide angle scattering (GIWAXS) techniques were employed. XRSA results revealed that deposited thin films have compressive stresses ranging from 9 GPa to 0.2 GPa depending on deposition conditions. It was observed that some of the films have out-of-plane (non-planar) preferred orientations.
Author
Fırat Anğay
How to Cite
Fırat Anğay (Doctorate thesis). Residual stress and texture analysis on TaN thin films, 2018, Dicle University.
Keywords
License
Tüm Hakları Saklıdır
This work is shared under the specified license terms.
More theses from Dicle University
- Evaluation of an-Najm Surah in terms of thematic commentary(2024)
- An analysis of the work 'al-Muhtasar fi Tafsir al-Qur'an al-Karim' from the perspective of tafsir methodology(2024)
- Turkish validity and reliability study of while-i̇n-bed-smartphone-use-i̇nduced sleep procrastination scale(2025)
- The situation of the disabled in islamic law(2010)
- Arkeological di̇scoveries in Cyprus by the British in the 19th century(2024)
- The relationship between school principals' servant leadership behaviors and perceived organizational support(2024)